The Meeting for Advanced Electron Beam Lithography (MAEBL)

The 8th Meeting for Advanced Electron Beam Lithography (MAEBL - www.maebl.org) unites an international community of electron beam lithographers, fostering engagement virtually and in person through events across different time zones. The Georgia Institute of Technology Institute for Electronics and Nanotechnology (IEN) will host the Foundations Workshop and Core Meetings. Bonus MAEBLx meetings will be also be held online prior to the main event.

MAEBL Meetings

• MAEBL 2024 Host Tour and Operations (1-5p EDT): Tuesday, September 24, 2024
• MAEBL 2024 Foundations Workshop (9a-5p EDT): Wednesday, September 25, 2024
• MAEBL 2024 Core Meeting (9a-5p EDT): Thursday, September 26, 2024

Program Highlights:

• View the MAEBL 2023 Program
• Full Registration ($185) provides full access to MAEBL 2024 and the bonus MAEBLx meetings scheduled in their respective time zones.
• Student Registration ($90) has been created to encourage growth in student participation online or in person.
• Exclusive access to the MAEBL GatherTown space, SLACK channels, and invited speakers.
• Open discussions in our Common Challenges segment, to pose live questions to the MAEBL community comprised of a serious group of EBL experts who love to share their knowledge.
• No nonsense EBL shop talk. More application than theory for the EBL practitioner.

Topics of discussion include but are not limited to:

• Proximity Effect Correction
• Resist Characterization
• Scripting and Automation
• Pattern Fidelity Enhancement
• Throughput Enhancement
• Pattern Transfer (Etch and/or Lift-off)
• Anti-charging
• Field Stitching
• Beam Drift
• Image Processing
• Data Preparation
• Simulation
• Device Fabrication

REGISTRATION and QUALIFICATIONS TO REGISTER

Registration helps to offset the operational costs of the meeting series. A single registration is not for an organization but for an individual and is not transferrable.

All active EBL users and tool owners from academic, industry, or government institutions are encouraged to attend. To promote intimate dialogue, we have kindly requested that EBL hardware vendors refrain from registering. Attendance is granted to organizers, speakers, and non-EBL-hardware vendor sponsors. Advance online sign-up is required to participate as there will be no on-site registration. Thank you for your cooperation and understanding.

Again, a single registration is for an individual (not an organization) and is not transferable. Please be mindful that we are a non-profit organization operated by volunteers. Anyone wishing to attend must register under their own name. An attempt to transfer registration undermines our mission and capacity to organize meetings for the electron beam lithography community.

ATTENDING IN PERSON

The health and safety of the MAEBL community are our primary concern. All attendees must abide by the host institution policies for on campus engagement: Covid-19 Institute Operations Updates – Stamps Health Services (gatech.edu). If you are attending in person, the host institution may require each attendee to be fully vaccinated and boosted. All attendees have the option to wear a face-covering regardless of vaccination status. During contact tracing, your information may be shared with the MAEBL Board, host, or any other responsible entities.

PRIVACY POLICY

In case of contact tracing or room block fulfillment, your contact information may be shared with responsible entities. Since this is a networking event, your name and email may be shared with other attendees. As part of our sponsorship program, your name and email will be shared with our sponsoring vendors. For all other purposes, your registration information will not be distributed without your consent.

REFUND POLICY

No refunds will be issued. Please be mindful that we are a volunteer operated non-profit organization. A single registration is for an individual, not an organization, and is not transferable. Anyone wishing to attend must register under their own name. An attempt to transfer registration undermines our mission and capacity to organize meetings for the electron beam lithography community. Thank you for your cooperation and understanding of this matter.